日本真空泵技術(shù)的發(fā)展趨勢
2009-08-10 14:31:58 閱讀()
來源:納乇真空技術(shù)有限公司 王為民作者:納乇真空技術(shù)有限公司 王為民
The trend of dry vacuum pump technology in Japan Ultratorr Technologies,Inc納乇真空技術(shù)有限公司 CEOKevin Wang王為民May9, 2009 The requirement from the marketing to drive dry pump technology Marketing trend------ huge volume production throughput with high yield for cost down like Moore’s Law in Semi marketing. . The dry pump was invented by semi customer requirement, Fujisun Semicon’requiredry pum to replace oil pump in the fa in 1981. The marketing overview ---Semiconductor .Currently 300mm Fab, production throughput around 100k. . The world's first 32nm fab on-target for delivery in 2009 .Next generation 450mm 22 Nanometer proce fab will landing in the next 5 years. ---LCD .Currently keyGen 8 Fab, 2600mm×2200mm glaize. .Next generation Gen 10 fab 3050mm×2850mm size is pilot-production now, total invest about USD4.5B. ---Solar cell . Gigawatt level throughput is the target. .Sharp new solar-fab will get 1.2 before 2012. ---OLED . Two PM-OLED ma production fa has landed in China. . Sony, Samsung begin to invest AM-OLED fa. Dry pump technology trend . ecial pump for ecificatio proce . Energy saving .Turn-key pump . Compact ecialump for ecification proce Typical pump like for load lock, PECVDD. Load lock pump Future: Fast pumping down for preure swing. Unozawa solution: Multi-stage booster to get high prureration in atmohere preure range. Load lock pump-XGiga60k-HMa XGiga6K-HMa pump unit coists of the M3600 Booster Pump and the TS500L Roughing Pump. The M3600 &amThe TS500L The M3600 Booster Pump Multi-stage High eed Booster Pump Pumping eed: 3,600m3/h The TS500L Multi-stage Roots type Dry pump High Pumping eed: 480m3/h XGi a60k-HMa futures Feature Benefits ☆ M3600(2-stage Roots type &am 3-lobe Rotor)→High preure ratio / High pumping eed ☆ TS500L(5-stage Roots type &am 3-lobe Rotor)→High pumping efficiency ☆ High performance brushle IPM motor→Low energy coumption ☆ Caed motor→Air leak tight cotruction Load Lock Chamber Evacuation Diagram pumpingdown curve S-P curve XGiga60k-LMc for PECVDroce Harsh proce---PECVD. High gas flow rate up to 200slm@1~2torr---High H2 gas throughput pump, big capacity forepump like TS500 is alied. Pumping efficiency for H2, dry pump is much higher than booster pump due to smaller clearance.. Gas loading---H2 and SiH4---”Safety is the best technology.” caed motor is alied, leak rate <1.0e-6 mbar.l/s.. NF3 cleaning between proce (etching) ---ecial material is alied for corrosive resistance.. By-products powder---over20 deg. C operat on temp. to avoid by-products XGi a60k-LMc The KMB4003E Booster Pump Single-stage High eedBooster Pumumping eed : 3600m3/h The TS500 fore-pump Multi-stage Roots type DryVacuum pumpHigh Pumping eed Pump :480m3/h Pumping eed2 &am H2 Energy saving . Large volume dry pump itall base in 300mm fab, G8 TFT-LCD fab, Solar cell fab, huge energy coumption including electric, cooling water,Nitrogen. .Energy saving become a crisis iue. The solution .70% is clean proce through to middle harsh proce in the fab . iNanojust fulfill this alication . Know-how ---IPM motor alied ---3 lob rotors with back-flow technology IPM motor withcontroller IPM motor-----Salient-pole, interior permanent magnet (IPM)rotor offers measurably higher energy efficiency and other benefits like adjustable-eed control of pum, fa, and compreors, represents a prime maitream alication for IPM motors. IPM rotor motors have tested at up to 98.3% efficiency nearly 50% weight savings compared to ac induction machines. IPM motors are controlled a standard adjustable-eed vector drive, requiring only some ecial software. Open- loop control is common. Power coumption and footprint---iNano pump .iNano 10030001203 Power coumption(W) 70090010001200 Condition: ultimate preure. Turn-key pump .Dry pump has a microproceor to monitor and control pump ruing automatic. .Pump operation parameters show in the control pad Control Pad Compact Large volume itall-base request compact pump The cost of fab cotruction is very expeive. To provide cotructiofee saving for the customer. iNano Pump volume (mm3) LXWXH iNano1003006031203 472×230×275450×230×550660×380×685810×380×685 Otherfuture .Quick hookuCooling water, electric, Nitrogen interface for oneerson operation. . Caed motor is a standard to get <1.0e-6 mbar.l/s leak rate, eliminatehaft seal to get a long term overhaul interval.
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